photolithography的翻译，读音
释义：
AI翻译
光刻术 (guāng kè shù)
解释：
光刻术是一种使用光线来刻蚀材料的工艺，常用于制造集成电路、微机电系统和其他微型器件。
其他翻译：
- 光刻 (guāng kè)
- 光致刻蚀 (guāng zhì kè shí)
- 光刻技术 (guāng kè jì shù)
注意：
"光刻" 和 "光刻术" 都是常用的翻译，"光刻术" 更强调技术和工艺。 "光致刻蚀" 和 "光刻技术" 通常在特定的技术领域中使用。
例句
The experiments show that the diffraction error can be eliminated with lens array photolithography method and high-quality grating can be developed. 实验表明透镜阵列光刻法，可以较好的消除衍射误差，研制出高质量的光栅。
Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography. 模拟和实验结果表明，对点阵或孔阵图形，在同样的图形尺度下，无掩模干涉光刻比传统光刻简单得多。
Atom photolithography is a new application of atom optics in microfabrication technical field. 原子光刻是原子光学在微细加工技术领域的新应用. 。
Alignment Precision - Displacement of patterns that occurs during the photolithography process. 套准精度 - 在光刻工艺中转移图形的精度. 。
photolithography combined with etching technique is the most commonly used technique for fabrication of silicon, glass and quartz microfluidic chips. 光刻和蚀刻技术常用于加工硅、玻璃和石英芯片。